Today, many bright photon beams in the ultraviolet and x-ray wavelength range are produced by insertion devices installed in specially designed third-generation storage rings. There is the possibility of producing photon beams that are orders of magnitude brighter than presently achieved at synchrotron sources, by using self-amplified spontaneous emission (SASE). At the Advanced Photon Source (APS), the low-energy undulator test line (LEUTL) free-electron laser (FEL) project was built to explore the SASE process in the visible through vacuum ultraviolet wavelength range. While the understanding gained in these experiments will guide future work to extend SASE FELs to shorter wavelengths, the APS FEL itself will become a continuously tunable, bright light source. Measurements of the SASE process to saturation have been made at 530 and 385 nm. A number of quantities were measured to confirm our understanding of the SASE process and to verify that saturation was reached. The intensity of the FEL light was measured versus distance along the FEL, and was found to flatten out at saturation. The statistical variation of the light intensity was found to be wide in the exponential gain region where the intensity is expected to be noisy, and narrower once saturation was reached. Absolute power measurements compare well with GINGER simulations. The FEL light spectrum at different distances along the undulator line was measured with a high-resolution spectrometer, and the many sharp spectral spikes at the beginning of the SASE process coalesce into a single peak at saturation. The energy spread in the electron beam widens markedly after saturation due to the number of electrons that transfer a significant amount of energy to the photon beam. Coherent transition radiation measurements of the electron beam as it strikes a foil provide additional confirmation of the microbunching of the electron beam. The quantities measured confirm that saturation was indeed reached. Details are given in Milton et al., Science 292, 2037 (2001) (also online at www.sciencexpress.org as 10.1126/science. 1059955, 17 May 2001), and Lewellen et al., “Present Status and Recent Results from the APS SASE FEL,” to be published in the Proceedings of the 23rd International Free-Electron Laser Conference, Darmstadt, Germany, 20–24 August 2001.
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March 2002
Papers from the 12th National Synchrotron Radiation Instrumentation Conference
22-24 August 2001
Madison, Wisconsin (USA)
Research Article|
March 01 2002
Self-amplified spontaneous emission saturation at the Advanced Photon Source free-electron laser (abstract) (invited)
E. R. Moog;
E. R. Moog
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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S. V. Milton;
S. V. Milton
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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N. D. Arnold;
N. D. Arnold
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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C. Benson;
C. Benson
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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W. Berg;
W. Berg
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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S. G. Biedron;
S. G. Biedron
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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M. Borland;
M. Borland
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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Y.-C. Chae;
Y.-C. Chae
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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R. J. Dejus;
R. J. Dejus
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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P. K. Den Hartog;
P. K. Den Hartog
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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B. Deriy;
B. Deriy
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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M. Erdmann;
M. Erdmann
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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E. Gluskin;
E. Gluskin
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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Z. Huang;
Z. Huang
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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K.-J. Kim;
K.-J. Kim
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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J. W. Lewellen;
J. W. Lewellen
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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Y. Li;
Y. Li
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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A. H. Lumpkin;
A. H. Lumpkin
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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O. Makarov;
O. Makarov
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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A. Nassiri;
A. Nassiri
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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V. Sajaev;
V. Sajaev
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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R. Soliday;
R. Soliday
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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B. J. Tieman;
B. J. Tieman
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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E. M. Trakhtenberg;
E. M. Trakhtenberg
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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G. Travish;
G. Travish
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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I. B. Vasserman;
I. B. Vasserman
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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N. A. Vinokurov;
N. A. Vinokurov
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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G. Wiemerslage;
G. Wiemerslage
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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B. X. Yang
B. X. Yang
Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439
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Rev. Sci. Instrum. 73, 1407 (2002)
Citation
E. R. Moog, S. V. Milton, N. D. Arnold, C. Benson, W. Berg, S. G. Biedron, M. Borland, Y.-C. Chae, R. J. Dejus, P. K. Den Hartog, B. Deriy, M. Erdmann, E. Gluskin, Z. Huang, K.-J. Kim, J. W. Lewellen, Y. Li, A. H. Lumpkin, O. Makarov, A. Nassiri, V. Sajaev, R. Soliday, B. J. Tieman, E. M. Trakhtenberg, G. Travish, I. B. Vasserman, N. A. Vinokurov, G. Wiemerslage, B. X. Yang; Self-amplified spontaneous emission saturation at the Advanced Photon Source free-electron laser (abstract) (invited). Rev. Sci. Instrum. 1 March 2002; 73 (3): 1407. https://doi.org/10.1063/1.1448152
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