Rigorous FEM-Simulation of Maxwell’s Equations for EUV-Lithography
Author: | Jan Pomplun |
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Document Type: | Master's Thesis |
Contributing Corporation: | Technische Universität Berlin |
Year of first publication: | 2006 |
URL: | http://www.zib.de/Numerik/NanoOptics/publications/PubText/Pomplun06.pdf |