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Thermal stability of rapidly quenched films in the Bi2O3-MO3 (M = Mo, W) systems

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Department of Industrial Chemistry, Faculty of Technology, Tokyo University of Agriculture and Technology, Koganeishi, 184, Tokyo, Japan

    T. Suzuki, T. Yamazaki, E. Hosaka & T. Kageyama

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  1. T. Suzuki
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  2. T. Yamazaki
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  3. E. Hosaka
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  4. T. Kageyama
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Suzuki, T., Yamazaki, T., Hosaka, E. et al. Thermal stability of rapidly quenched films in the Bi2O3-MO3 (M = Mo, W) systems. J Mater Sci Lett 6, 413–414 (1987). https://doi.org/10.1007/BF01756780

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  • DOI: https://doi.org/10.1007/BF01756780

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