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Ion-beam sputtering apparatus with a simplified accelerator system for deposition of thin films

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Journal of Materials Science Letters

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References

  1. H. R. KAUFMAN,Adv. Electron. Electron Phys. 36 (1974) 265.

    Google Scholar 

  2. J. M. E. HARPER, “Thin Film Processes” (Academic, New York, 1978) p. 175.

    Google Scholar 

  3. R. S. ROBINSON,J. Vac. Sci. Technol. 15 (1978) 277.

    Google Scholar 

  4. H. R. KAUFMAN, J. M. E. HARPER and J. J. CUOMO,ibid. 16 (1979) 899.

    Google Scholar 

  5. M. NAOE, N. TERADA, Y. HOSHI and S. YAMANAKA,IEEE Trans. Magn. MAG-20 (1984) 1311.

    Google Scholar 

  6. H. R. KAUFMAN, P. D. READER and G. C. ISAACSON,AIAA J. 15 (1977) 843.

    Google Scholar 

  7. J. F. WASSERBAUER, NASA TN D-3628 (1966).

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Authors and Affiliations

  1. Department of Industrial Chemistry, Faculty of Technology, Tokyo University of Agriculture and Technology, 184, Koganeishi, Tokyo, Japan

    T. Suzuki, T. Yamazaki, H. Yoshioka, K. Takahashi & T. Kageyama

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  1. T. Suzuki
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  2. T. Yamazaki
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  3. H. Yoshioka
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  4. K. Takahashi
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  5. T. Kageyama
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Suzuki, T., Yamazaki, T., Yoshioka, H. et al. Ion-beam sputtering apparatus with a simplified accelerator system for deposition of thin films. J Mater Sci Lett 6, 437–438 (1987). https://doi.org/10.1007/BF01756789

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  • DOI: https://doi.org/10.1007/BF01756789

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