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Pavelescu, C., Cobianu, C. Correlations between the properties and the deposition kinetics of low-temperature chemical vapour deposited SiO2 films: the effect of O2/SiH4 mole ratio. J Mater Sci Lett 9, 143–144 (1990). https://doi.org/10.1007/BF00727697
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DOI: https://doi.org/10.1007/BF00727697