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Thermal characterization by photodeflection method

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Abstract

The photodeflection technique is useful not only for thermal diffusivity measurements but also to supply a thermal imaging system. The experimental setup and the basic theoretical aspects for determining the temperature profile are discussed together with the experimental results on a semiconductor laser diode.

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Authors and Affiliations

  1. Dipartimento di Energetica, Università di Roma ‘La Sapienza’, Via A. Scarpa 16, 00161, Roma, Italy

    M. Bertolotti, G. L. Liakhou, R. Li Voti & C. Sibilia

  2. GNEQP of CNR, INFM, Italy

    M. Bertolotti, G. L. Liakhou, R. Li Voti & C. Sibilia

  3. PF Materiali Speciali of CNR, Italy

    M. Bertolotti, G. L. Liakhou, R. Li Voti & C. Sibilia

  4. Technical University of Moldova, Stephan Cel Mare, 277012, Kishinev, Moldova

    G. L. Liakhou

Authors
  1. M. Bertolotti
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  2. G. L. Liakhou
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  3. R. Li Voti
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  4. C. Sibilia
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Bertolotti, M., Liakhou, G.L., Li Voti, R. et al. Thermal characterization by photodeflection method. Journal of Thermal Analysis 47, 51–65 (1996). https://doi.org/10.1007/BF01982685

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  • DOI: https://doi.org/10.1007/BF01982685

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