Summary
Degradation of near band gap photo-luminescence emission in GaAs with time of exposure to low power, c.w. laser excitation at room temperature is quantitatively described by a model based on defect reactions that are promoted by trapping and recombination of excess carriers at nonradiative recombination sites. The proposed model accurately describes the observed degradation rate, its power and temperature dependence, as well as the absence of degradation at a surface with shallow ion implantation.
Riassunto
La diminuzione della luminescenza (vicino al band gap) nel GaAs durante illuminazione continua a bassa intensità e a temperatura ambiente è quantitativamente spiegata da un modello in cui le reazioni tra i difetti reticolari in prossimità della superficie sono promosse dall’intrappolamento e dalla ricombinazione delle cariche elettriche in centri di ricombinazione senza emissione luminosa. Il modello che proponiamo spiega accuratamente le osservazioni sperimentali: la velocità di diminuzione della luminescenza stessa, la sua dipendenza dall’intensità dell’illuminazione esterna e dalla temperatura e la mancata diminuzione della luminescenza quando il GaAs è impiantato a bassa profondità.
Резюме
Количественно описывается деградация фото-люминесцентного излучения вблизи запрещенной зоны в GaAs со временем экспозиции c.w.-лазерным возбуждением малой мощности при комнатной температуре с помощью модели, которая основана на реакции дефектов, которые стимулируют захват и рекомбинацию носителей в нерадиационных узлах рекомбинации. Предложенная модель описывает наблюдаемую интенсивность деградации, зависимость деградации от мощности и температуры, а также отсутствие деградации на поверхности в случае неглубокой имплантации ионов.
Similar content being viewed by others
References
M. J. Luciano andD. L. Kingston:Rev. Sci. Instrum.,49, 718 (1978).
M. Yokogawa, S. Nishine, K. Matsumoto, Shin-Ichi Akai andH. Okada:Jpn. J. Appl. Phys.,23, 663 (1984).
H. J. Hovel andD. Guidotti:IEEE Trans. Electron Devices,ED-32, 2331 (1985).
H. J. Hovel, M. Albert, D. Guidotti, E. Farrell andJ. Becker:Semi-Insulating III-V Materials (Ohmsha, Ltd., 1986), p. 97.
D. Guidotti, H. J. Hovel, M. Albert andJ. Becker:Review of Progress in Quantitative Nondestructive Evaluation, Vol.6 B, edited byD. O. Thompson andD. E. Chimenti (Plenum Press, New York, N. Y., 1987), p. 1369.
W. Wettling andJ. Windscheif:Appl. Phys. A,40, 191 (1986).
J. Marek, A. G. Wilke andR. Geiss:Appl. Phys. Lett.,49, 1732 (1986).
D. Guidotti, E. Hasan, H. J. Hovel andM. Albert:Appl. Phys. Lett.,50, 912 (1987).
T. Suzuki andM. Ogawa:Appl. Phys. Lett.,31, 473 (1977).
H. Booyens, J. H. Basson, A. W. R. Leitch, M. E. Lee andC. M. Stander:Surf. Sci,130, 259 (1983).
This temperature behavior was also independently observed by M. B. Johnson and coworkers (T. J. Watson, Sr. Laboratory of Applied Physics, California Institute of Technology, Pasadena, Cal.) and reported to us by M.B.J. in private communications. Lack of temperature dependence at elevated temperatures in an inert atmosphere is reported byN. A. Ives, G. W. Stupian andM. S. Leung:Appl. Phys. Lett.,50, 256 (1987).
The incident laser beam is assumed to have a cylindrically symmetric Gaussian power distribution. The spot size is taken at the 1/e 2 points as in ref. (8).
H. J. Leamy andL. C. Kimerling:J. Appl. Phys.,48, 2795 (1977).
P. J. Dean andW. J. Choyke:Adv. Phys.,26, 1 (1977), and references therein.
M. K. Sheinkman, N. E. Korsunskaya, I. V. Markevich andT. V. Torchinskaya:J. Phys. Chem. Solids,43, 475 (1982).
L. C. Kimerling:Solid State Electron.,21, 1391 (1978), and references therein.
J. R. Troxell, A. P. Chatterjee, G. D. Watkins andL. C. Kimerling:Phys. Rev. B,19, 5336 (1979).
R. M. Feenstra andT. C. McGill:Phys. Rev. B,25, 6329 (1982).
L. C. Kimerling andJ. L. Benton:Physica B&C,116, 297 (1983).
P. G. Eliseev, I. N. Zavestovskaya andI. A. Poluéktov:Kvantovaya Electron., (Moscow),5, 203 (1978) [English translation:Sov. J. Quantum Electron.,8, 124 (1978)].
J. C. Bourgoin andJ. W. Corbertt:Radiat. Eff.,36, 157 (1978), and references therein.
J. C. Bourgoin andJ. W. Corbett:IEEE Trans. Nucl. Sci., NS-18, 11 (1971).
D. Stievenard andJ. C. Bourgoin:Phys. Rev. B,33, 8410 (1986).
A. E. Kiv andF. T. Umarova:Fiz. Tekh. Poluprovodn.,4, 571 (1970) [English translation:Sov. Phys. Semicond.,4, 474 (1970)].
V. M. Lenchenko:Fiz. Tverd. Tela,11, 649 (1969) [English translation:Sov. Phys. Solid State,11, 649 (1969)].
G. H. Vineyard:Radiat. Eff.,29, 245 (1976).
Y. Nannichi, J. Matsui andK. Ishida:Jpn. J. Appl. Phys.,14, 1561 (1975).
N. E. Korsunskaya, I. V. Markevich andM. K. Sheinkman:Phys. Status Solidi,13, 25 (1966).
N. E. Korsunskaya, I. V. Markevich andM. K. Sheinkman:Fiz. Tverd. Tala,10, 522 (1968) [English translation:Sov. Phys. Solid State,10, 409 (1968)].
M. K. Sheinkman, N. E. Korsunskaya, I. V. Markevich andT. V. Torchinskaya:Fiz. Tekh. Polyprovodn.,14, 438 (1980) [English translation:Sov. Phys. Semicond.,14, 259 (1980)].
H. Henry andD. V. Lang:Phys. Rev. B,15, 989 (1977).
H. Sumi:Phys. Rev. B,27, 2374 (1983).
V. Narayanamurti, R. A. Logan andM. A. Chin:Phys. Rev. Lett.,40, 63 (1978).
D. V. Lang andL. C. Kimerling:Phys. Rev. Lett.,33, 489 (1974).
D. V. Lang andL. C. Kimerling:Appl. Phys. Lett.,28, 248 (1976).
D. V. Lang, L. C. Kimerling andS. Y. Leung:J. Appl. Phys.,47, 3587 (1976).
J. Shirafuji, T. Kakiuchi, K. Oka andY. Inuishi:Jpn. J. Appl. Phys.,22, 1368 (1983).
C. E. Barnes:Phys. Rev. B,1, 4735 (1970).
G. C. Kuczynski andR. F. Hochman:Phys. Rev.,108, 946 (1957).
G. C. Kuczynski, K. R. Iyer andC. W. Allen:J. Appl. Phys.,43, 1337 (1972).
B. Monemar, R. M. Potemski, M. D. Small, J. A. Van Vechten andG. R. Woolhouse:Phys. Rev. Lett.,41, 260 (1978).
K. Maeda andS. Takeuchi:J. Phys. (Paris) Coll.,44, C4–375 (1983).
K. Maeda, M. Sato, A. Kubo andS. Takeuchi:J. Appl. Phys.,54, 161 (1983).
K. H. Küsters andH. Alexander:Physica B,116, 594 (1983).
R. A. Vardanyan, V. Ya. Kravchenko andYu. A. Osip’yan:Pis’ma Ž. Ėksp. Teor. Fiz.,40, 248 (1984) [English translation:JETP Lett.,40, 1023 (1984)].
R. D. Gold andL. R. Weisberg:Solid State Electron.,7, 811 (1964).
I. Hayashi:J. Phys. Soc. Jpn., Suppl. A,49, 57 (1980).
J. A. Van Vechten:J. Electrochem. Soc.,122, 423 (1975).
J. A. Van Vechten:J. Electrochem. Soc.,122, 1556 (1975).
J. A. Van Vechten:Physica B,116, 575 (1983).
See, for example,C. L. Zipfel: inSemiconductors and Semimetals, Vol.22, edited byR. K. Willardson andA. C. Beer (Academic Press, New York, N. Y., 1985), p. 249.
M. S. Skolnick, L. J. Reed andA. D. Pitt:Appl. Phys. Lett.,44, 447 (1984).
J. Jiménez, M. A. González, P. Hernández, J. A. de Saja andJ. Bonnafé:J. Appl. Phys.,57, 1152 (1985).
H. J. Queisser:Appl. Phys. Lett.,46, 757 (1985).
C. S. Hong andH. L. Hwang:Appl. Phys. Lett.,49, 645 (1986).
M. Stutzmann, W. B. Jackson andC. C. Tsai:Phys. Rev. B,32, 23 (1985).
S. Chandrasekhar:Rev. Mod. Phys.,15, 1 (1943).
A. M. Barnett: inSemiconductors and Semimetals, edited byR. K. Willardson andA. C. Beer Vol.6 (Academic Press, New York, N. Y., 1970), p. 141.
D. Pooley andW. A. Runciman:Solid State Commun.,4, 351 (1966).
F. Seitz andJ. S. Koehler:Solid State Phys.,2, 351 (1956).
H. Sumi:Phys. Rev. B,29, 4616 (1984).
J. D. Weeks, J. C. Tully andL. C. Kimerling:Phys. Rev. B,12, 3286 (1975).
P. J. Robinson andK. A. Holbrook:Unimolecular Reactions (Wiley-Interscience, London, 1972), Chapt. 1, 3.
Y. Toyozawa:Physica B&C,116, 7 (1983).
A. M. Stoneham:Rep. Prog. Phys.,44, 1251 (1981).
M. K. Sheinkman:Pis’ma Ž Ėksp. Teor. Fiz.,38, 278 (1983) [English translation:JETP Lett.,38, 330 (1983)].
The term «phonon-kick» has also been used in conjunction with the thermal mechanism. It is used in ref. in a different context
H. Sumi:Physica B,117–118, 197 (1983).
H. B. Bebb andE. W. Williams: inSemiconductors and Semimetals, edited byR. K. Willardson andA. C. Beer, Vol.8 (Academic Press, New York, N. Y., 1972), p. 1.
J. S. Blakemore andS. Rahimi: inSemiconductors and Semimetals, edited byR. K. Willardson andA. C. Beer Vol.20 (Academic Press, New York, N. Y., 1984), p. 233.
D. C. Look, P. W. Yu, W. M. Theis, W. Ford, G. Mathur, J. R. Sizelove, D. H. Lee andS. S. Li:Appl. Phys. Lett.,49, 1083 (1986).
M. Nakajima, T. Sato, T. Inada, T. Fukuda andK. Ishida:Appl. Phys. Lett.,49, 1251 (1986).
See, for example,C. G. Kirkpatrick, R. T. Chen, D. E. Holmes, P. M. Asbeck, K. R. Elliott, R. D. Fairman andJ. R. Oliver: inSemiconductors and Semimetals, edited byR. K. Willardson andA. C. Beer, Vol.20 (Academic Press, New York, N. Y., 1984), p. 159.
T. F. Kuech: IBM T.J. Watson Research Ctr., private communciations.
A. S. Jordan, A. R. von Neida, R. Caruso andC. K. Kim:J. Electrochem. Soc.,121, 153 (1974).
D. von der Linde, J. Kuhl andH. Klingenberg:Phys. Rev. Lett.,44, 1505 (1980).
E. W. Williams andR. A. Chapman:J. Appl. Phys.,38, 2547 (1967).
J. Vilms andW. E. Spicer:J. Appl. Phys.,36, 2815 (1965).
NeglectingB makes eq. (6) only approximately valid, however, the PL degradation characteristics calculated with this assumption should remain qualitatively correct.
M. Gershenzon:Semiconductors and Semimetals, edited byR. K. Willardson andA. C. Beer, Vol.1 (Academic Press, New York, N. Y., 1967), p. 305.
In the presence of ambipolar diffusion it can be shown thatΓ 2 becomes proportional to [AN(t)]−3/2.
R. M. Gibb, G. J. Rees, B. W. Thomas, B. L. H. Wilson, B. Hamilton, D. R. Wight andN. F. Mott:Philos. Mag.,36, 1021 (1977).
Author information
Authors and Affiliations
Additional information
Summer student from the Materials Sciences Department at Massachusetts Institute of Technology, Cambridge, Mass., USA.
Rights and permissions
About this article
Cite this article
Guidotti, D., Hasan, E., Hovel, H.J. et al. Model for degradation of band gap photo-luminescence in GaAs. Il Nuovo Cimento D 11, 583–613 (1989). https://doi.org/10.1007/BF02457514
Received:
Issue Date:
DOI: https://doi.org/10.1007/BF02457514