Indium layers in low-temperature gallium arsenide: Structure and how it changes under annealing in the temperature range 500–700 °C

Abstract

Transmission electron microscopy is used to study the microstructure of indium δ layers in GaAs(001) grown by molecular beam epitaxy at low temperature (200 °C). This material, referred to as LT-GaAs, contains a high concentration (≈10²⁰ cm⁻³) of point defects. It is established that when the material is δ-doped with indium to levels equivalent to 0.5 or 1 monolayer (ML), the roughness of the growth surface leads to the formation of InAs islands with characteristic lateral dimensions <10 nm, which are distributed primarily within four adjacent atomic layers, i.e., the thickness of the indium-containing layer is 1.12 nm. Subsequent annealing, even at relatively low temperatures, leads to significant broadening of the indium-containing layers due to the interdiffusion of In and Ga, which is enhanced by the presence of a high concentration of point defects, particularly V _Ga, in LT-GaAs. By measuring the thickness of indium-containing layers annealed at various temperatures, the interdiffusion coefficient is determined to be D _In-Ga=5.1×10⁻¹² exp(−1.08 eV/kT) cm²/s, which is more than an order of magnitude larger than D _In-Ga for stoichiometric GaAs at 700 °C.