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Depth resolution in sputter profiling

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Abstract

The dependence of depth resolution on sputter depth due to various parameters is theoretically estimated. Comparison with experimental work of different authors shows the validity of the proposed model.

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Authors and Affiliations

  1. Institut für Werkstoffwissenschaften, Max-Planck-Institut für Metallforschung, Seestraße 92, D-7000, Stuttgart 1, Fed. Rep. Germany

    S. Hofmann

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  1. S. Hofmann
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Hofmann, S. Depth resolution in sputter profiling. Appl. Phys. 13, 205–207 (1977). https://doi.org/10.1007/BF00882481

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  • DOI: https://doi.org/10.1007/BF00882481

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