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The characteristics of high current amorphous silicon diodes

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Amorphous siliconpn junctions with various doping profiles have been prepared by the glow discharge technique and the effect of the barrier profile on electrical properties investigated. Current densities of up to 40 A cm−2 with rectification ratios of 104–105 were obtained withn +−ν−p + structures. The diode quality factor has also been investigated, both in the dark and under illumination.

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Gibson, R.A., Le Comber, P.G. & Spear, W.E. The characteristics of high current amorphous silicon diodes. Appl. Phys. 21, 307–311 (1980). https://doi.org/10.1007/BF00895919

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  • DOI: https://doi.org/10.1007/BF00895919

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