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Diffusion of nitrogen in vanadium and niobium

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Abstract

The diffusion of N in the group VB metals V and Nb has been studied in the previously uninvestigated temperature range 300–500 °C using ion-beam techniques. Diffusion couples were created by ion implantation. The time-dependent diffusion profiles were monitored by the use of the Nuclear Resonance Broadening (NRB) technique. New values for the solubility of N in Nb were obtained. The diffusion rates presented support recent observations of the diffusivity of interstitial impurities in body-centered cubic metals in which positive deviations from Arrhenius behaviour have been seen at high temperatures.

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Keinonen, J., Räisänen, J. & Anttila, A. Diffusion of nitrogen in vanadium and niobium. Appl. Phys. A 34, 49–56 (1984). https://doi.org/10.1007/BF00617574

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