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Annealing behaviour of implanted nitrogen in bulk and evaporated Ni

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Abstract

The diffusion coefficients of nitrogen in N-implanted polycrystalline Ni have been deduced. Both bulk and Ni-evaporated samples implanted with nitrogen were annealed at 150–500° C. The nitrogen profiles were probed using the nuclear resonance broadening technique. The value of 0.99±0.12 eV for the activation energy and (3.0 +40−2.8 )×10−6 cm2/s for the frequency factor were obtained for implanted N in bulk Ni. The solubilities for both the bulk and evaporated Ni samples are given. In evaporated Ni nitrogen migration is enhanced due to the defects arising during evaporation.

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References

  1. L.M. Wielunski, D.M. Scott, M-A. Nicolet, H. von Seefeld: Appl. Phys. Lett.38, 106–108 (1981)

    Google Scholar 

  2. D.M. Scott, L.M. Wielunski, H. von Seefeld, M-A. Nicolet: Nucl. Instr. Meth.92, 661–666 (1981)

    Google Scholar 

  3. T. Banwell, M-A. Nicolet, D.M. Scott: Thin Solid Films107, 67–71 (1983)

    Google Scholar 

  4. M.F. Zhu, F.C.T. So, M-A. Nicolet: Thin Solid Films130, 245–251 (1985)

    Google Scholar 

  5. A. Anttila, M. Bister, A. Fontell, K.B. Winterbon: Radiat. Eff.33, 13–19 (1977)

    Google Scholar 

  6. J. Hirvonen, A. Anttila: Scr. Metall.11, 1139–1142 (1977)

    Google Scholar 

  7. D. Bergner:DIMETA-82, Diffusion in Metals and Alloys, ed. by F.J. Kedves and D.L. Beke (Trans. Tech. Publications, Switzerland 1983) pp. 223–240

    Google Scholar 

  8. J. Hirvonen: Appl. Phys.23, 349–354 (1980)

    Google Scholar 

  9. C.J. Smithells (ed.):Metals Reference Book, 5th edn. (Butterworth, London 1976) p. 848

    Google Scholar 

  10. H.J. Grabke, E.M. Petersen: Scr. Metall.12, 1111–1114 (1978)

    Google Scholar 

  11. A. Anttila, J. Hirvonen: Appl. Phys. Lett.35, 394–396 (1978)

    Google Scholar 

  12. A. Seeger, H. Mehrer:Vacancies and Interstitials in Metals, ed. by A. Seeger et al. (North-Holland, Amsterdam 1970) p. 1

    Google Scholar 

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Authors and Affiliations

  1. Department of Physics, University of Helsinki, SF-00170, Helsinki, Finland

    R. Lappalainen & A. Anttila

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  1. R. Lappalainen
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  2. A. Anttila
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Lappalainen, R., Anttila, A. Annealing behaviour of implanted nitrogen in bulk and evaporated Ni. Appl. Phys. A 42, 263–267 (1987). https://doi.org/10.1007/BF00616560

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  • DOI: https://doi.org/10.1007/BF00616560

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