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Transmission electron microscopy study of defects in Sn-doped GaAs films grown by molecular beam epitaxy

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Abstract

Films of GaAs, heavily doped with Sn, which have been grown by molecular-beam epitaxy are found to contain single-crystal Sn particles situated in the nearsurface region of the epilayer GaAs. The morphology and chemical composition of the particles have been examined by using cross-section transmission electron microscopy combined with energy-dispersive x-ray spectroscopy. Different growth conditions were used to study the Sn-particle formation and high-resolution transmission electron microscopy was used to investigate microstructures. The observations are discussed in terms of several models previously proposed for these phenomena.

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Chen, S.H., Carter, C.B. & Enquist, P. Transmission electron microscopy study of defects in Sn-doped GaAs films grown by molecular beam epitaxy. Appl. Phys. A 44, 143–151 (1987). https://doi.org/10.1007/BF00626415

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  • DOI: https://doi.org/10.1007/BF00626415

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