Abstract
Polymeric styrene films with thicknesses ranging from about one nm up to a few μm have been deposited by means of a direct ion beam deposition (IBD) technique. The deposition energy, which can be chosen independently of the parameters which govern the plasma conditions, has been varied between few eV and 1000 eV. The correlation between the deposition parameters and the resulting film properties in terms of the electronic structure is discussed. The in situ characterization by electron spectroscopy has proved to be a very useful characterization method and ultraviolet photoelectron spectroscopy in particular revealed an extremely high sensitivity to structural differences in the deposited films. The polymeric films have also been characterized by scanning electron microscopy and optical spectroscopy. These techniques have also served to compare films prepared by the direct IBD technique with films obtained by standard rf plasma polymerization (RFPP) in a tubular reactor. Significant differences have been found which are dependent on the deposition parameters; these are discussed in detail.
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References
H. Yasuda: Plasma Polymerization (Academic, New York 1985)
S. Aisenberg, R.W. Chabot: J. Appl. Phys. 42, 2953 (1971)
C. Weissmantel, K. Bewilogua, C. Schürer, K. Breuer, Z. Zscheile: Thin Solid Films 61, L 1 (1979)
M.J. Mirtich: In Amorphous Hydrogenated Carbon Films, ed. by P. Koidl, P. Oelhafen (Les Editions de Physique, Les Ulis 1987) p. 377
P. Oelhafen, D. Ugolini: “Photoelectron spectroscopy measurements on in situ prepared a-C: H films”. In Amorphous Hydrogenated Carbon Films, ed. by P. Koidl, P. Oelhafen (Les Editions de Physique, Les Ulis 1987) p. 267
C. Weissmantel: In Amorphous Hydrogenated Carbon Films ed. by P. Koidl, P. Oelhafen (Les Editions de Physique, Les Ulis 1987) p. 49
H.R. Kaufman: J. Vac. Sci. and Technol. 15, 272 (1978)
D. Ugolini, P. Oelhafen, M. Wittmer: “Characterization of a-C:H/substrate interfaces by electron spectroscopy measurements I: Semiconducting substrates”. In Amorphous Hydrogenated Carbon Films ed. by P. Koidl, P. Oelhafen (Les Editions de Physique, Les Ulis 1987) p. 287
D. Ugolini, J. Eitle, P. Oelhafen, M. Wittmer: Appl. Phys. A 48, 549 (1989)
J.W. Rabalais, R.J. Colton: J. Electron. Spectrosc. Rel. Phen. 1, 83 (1972/1973)
J.J. Yeh, I. Lindau: At. Data Nucl. Data Tables 32, 1 (1985)
D.T. Clark, D.B. Adams, A. Dilks, J. Peeling, H.R. Thomas: J. Electron Spectrosc. Rel. Phen. 8, 51 (1976)
A. Richter, H.J. Scheile, W. Pompe, K.W. Brzezinka, I. Mühlung: J. Non-Cryst. Solids 88, 131 (1986)
L.J. Bellamy: Infrared Spectra of Complex Molecules, 3rd edition (Wiley, New York 1975)
B. Dischler: “Bonding and Hydrogen Incorporation in a-C:H Studied by Infrared Spectroscopy. In Amorphous Hydrogenated Carbon Films, ed. by P. Koidl, P. Oelhafen (Les Editions de Physique, Les Ulis 1987) p. 189
C.B. Duke, W.R. Salaneck, T.J. Fabish, J.J. Ritsko, H.R. Thomas, A. Paton: Phys. Rev. B 18, 5717 (1978)
D. Ugolini, J. Eitle, P. Oelhafen: “Influence of process gas and deposition energy on the atomic electronic structure of diamond-like (a-C:H) films”. Submitted to Vacuum
P. Oelhafen, J.L. Freeouf, J.M.E. Harper, J.J. Cuomo: Thin Solid Films 120, 231 (1984)
C. Wild, P. Koidl, J. Wagner: In Amorphous Hydrogenated Carbon Films, ed. by P. Koild, P. Oelhafen (Les Editions de Physique, Les Ulis 1987) p. 137
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Department of Chemical Engineering, Beijing Institute of Technology, P.O. Box 327 Beijing, 100081 Beijing, P.R. China
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Ugolini, D., Tuilier, M.H., Eitle, J. et al. Direct ion beam deposition of polymeric styrene films and in situ characterization by electron spectroscopy. Appl. Phys. A 51, 526–536 (1990). https://doi.org/10.1007/BF00324737
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DOI: https://doi.org/10.1007/BF00324737