Abstract
The densification process by ion-assisted physical vapour deposition of films is considered as a consequence of rearrangement of atoms in the near-surface film layer. A model is proposed allowing the quantitative estimate of the optimum ion current density required to produce a film with maximum density.
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Grigorov, G.I., Grigorov, K.G., Sporken, R. et al. Ion-induced densification of pvd films—a choice of the optimum density of ion bombardment. Appl. Phys. A 63, 399–401 (1996). https://doi.org/10.1007/BF01567334
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DOI: https://doi.org/10.1007/BF01567334