Exceptions to the microstructure zone model revealed by the reactive d.c. magnetron sputter deposition of δ-TiNx thin films

doi:10.1016/0257-8972(93)90136-C

Surface and Coatings Technology

Volume 60, Issues 1–3, 8 October 1993, Pages 480-483

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Abstract

This paper deals with the influence of the nitrogen flow rate on the microstructure of δ-TiN_x films prepared by d.c. magnetron sputtering. The δ-TiN_x films were prepared under decreasing nitrogen flow rates to obtain nitrogen contents in the films ranging from x=0.99 to 0.95. Ion bombardment of the films was negligible in these experiments.

Some films prepared under deposition conditions which typically result in a fine-grain (about 0.1 μm) transition zone microstructure exhibit a “large”-grain (about 1 μm) zone III microstructure. It has been demonstrated that there exists a narrow area of nitrogen flow rate for which the microstructure of the films does not agree with the zone model. The large-grain films are stress free. The nitrogen content in the films containing large grains is x=0.97. All deposition conditions except the nitrogen flow rate were kept constant in this experiment. Chemical energy dissipated during the reactive process can explain the observed effects.

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^∗: Permanent address: Institute of Physics, Czech Academy of Sciences, Na Slovance 2, CS-180 40 Prague, Czech Republic.

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Exceptions to the microstructure zone model revealed by the reactive d.c. magnetron sputter deposition of δ-TiNx thin films

Abstract

Mater. Sci. Eng. A

Fiz. Metall. Metalloved

Ann. Rev. Mater. Sci.

Exceptions to the microstructure zone model revealed by the reactive d.c. magnetron sputter deposition of δ-TiN_x thin films