Progress in the characterization of nanophase diamond films uniquely produced by a laser plasma discharge source

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Abstract

Films of nanophase diamond can be deposited at room temperature with a laser plasma discharge source of multiply charged carbon ions, without the use of any catalyst in the growth mechanism. The beam from a pulsed Nd:YAG laser is focused on graphite at intensities in excess of 1011W cm-2 and the resulting plasma ejects carbon ions carrying energies of about 1 keV through a discharge space to the substrates to be coated. The high energies of condesation produce interfacial layers between the film and substrate materials, which provide levels of adhesion which can support the protection of substrates subjected to harsh environmental conditions. In this paper, recent advances in the characterization of nanophase diamond films are given. Emphasis has been placed on studies of the bonding and properties realized in one example; i.e. the deposition of nanophase diamond on stainless steel. Measurements with Rutherford backscattering spectrometry showed that the diamond coatings deposited from laser plasmas were bonded to the stainless steel substrates through interfacial layers with significant thickness. The resistance to wear was estimated with a modified sandblaster and it was shown that a coating of only 2 μm of nanophase diamond can increase the lifetime of the sample by a factor of better than 36. The results of other mechanical measurements, such as those obtained by friction tests, are also given.

References (18)

  • D.R. McKenzie et al.

    Thin Solid Films

    (1991)
  • L.R. Doolittle

    Nucl. Instrum. Methods B

    (1985)
  • T.J. Lee et al.

    Surf. Coat. Technol.

    (1992)
  • C.B. Collins et al.

    Appl. Phys. Lett.

    (1989)
  • F. Davanloo et al.

    J. Appl. Phys.

    (1990)
  • F. Davanloo et al.

    J. Mater. Res.

    (1990)
  • C.B. Collins et al.

    J. Appl. Phys.

    (1991)
  • F. Davanloo et al.

    J. Appl. Phys.

    (1992)
  • C.B. Collins et al.

    J. Appl. Phys.

    (1992)
There are more references available in the full text version of this article.

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