Epitaxial phase transitions in the iron/silicon system
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Silicide layer formation in evaporated and sputtered Fe/Si multilayers: X-ray and neutron reflectivity study
2013, Applied Surface ScienceCitation Excerpt :Since the silicide layer is formed due to spontaneous interdiffusion of Fe and Si atoms, its thickness plays a very important role on the strength of AF coupling [8]. Various silicides like FeSi [9,10], FeSi2 [11,12] and Fe3Si [13] have been reported to be formed at the interface of Fe/Si multilayer. Among these, common phase formed at the interface of Fe/Si multilayer is FeSi while FeSi2 is formed at high temperature [11] and Fe3Si phase occurs when thickness of the Fe layer is sufficiently large as compared to Si [13].
XRD and XPS characterisation of transition metal silicide thin films
2012, Surface ScienceCitation Excerpt :Meanwhile, the electronic structure (i.e. total DOS), the chemical-state information, surface chemical composition and electron screening effect can be determined by means of XPS and AES measurements [53]. At present, many studies have already been devoted to the fundamental study of other 3d and 4d transition metal silicides [5–52]. In this context, it is of prime importance to understand how thin film structure and phase formation sequence correlate to one another.
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