The use of neutral Cs vapor flow in a negative-ion sputter source

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Abstract

Neutral Cs vapor flowing onto the sputter target in an inverted negative ion Cs sputter source has been used to enhance the intensity of the negative ion beam.

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Cited by (1)

  • A high-intensity multisample Cs sputter source

    1990, Nuclear Inst. and Methods in Physics Research, B

This research was supported by the US Department of Energy under Contract W-31-109-Eng-38.

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