ISSN:
1089-7550
Quelle:
AIP Digital Archive
Thema:
Physik
Notizen:
Polycrystalline bcc TixW1−x layers with mixed 011 and 002 texture were grown on oxidized Si(001) substrates at 600 °C by ultrahigh-vacuum (UHV) magnetron sputter deposition from W and Ti0.33W0.67 targets using both pure Ar and Xe discharges. Ti concentrations in the 100-nm-thick layers were 0, 6, and 33 at. % depending on target composition and sputtering gas. Al overlayers, 190 nm, thick with strong 111 preferred orientation, were then deposited in Ar at 100 °C with and without breaking vacuum. Changes in bilayer sheet resistance Rs were monitored as a function of time ta and temperature Ta during subsequent UHV annealing. Thermal ramping of Al/W and Al/Ti0.06W0.94 bilayers at 3 °C min−1 resulted in large (〉fourfold) increases in Rs at Ta(similar, equals)550 °C, whereas Rs in the Al/Ti0.33W0.67 bilayers did not exhibit a similar increase until (similar, equals)610 °C. Area-averaged and local interfacial reactions and microstructural changes were also followed as a function of annealing conditions. The combined results indicate that Al/W and Al/Ti0.06W0.94 bilayer reactions proceed along a very similar pathway in which monoclinic WAl4 forms first as a discontinuous interfacial phase followed by the nucleation of bcc WAl12 whose growth is limited by the rate of W diffusion, with an activation energy of 2.7 eV, into Al. In contrast, the W diffusion rate during the early stages of Al/Ti0.33W0.67 annealing is significantly higher allowing the formation of a continuous WAl4 interfacial blocking layer which increases the overall activation energy Ea, still limited by W diffusion, to 3.4 eV and strongly inhibits further reaction. We attribute observed increases in WAl4 nucleation and growth rates in interfacial Al/Ti0.33W0.67 to a "vacancy wind" effect associated with the very rapid (Ea=1.7 eV) diffusion of Ti into Al. © 1997 American Institute of Physics.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1063/1.366039
