ISSN:
0001-1541
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Process Engineering, Biotechnology, Nutrition Technology
Notes:
The development phase of the optical photolithography process has long been considered the most crucial, as it is the final image-forming step. Process monitoring methods have focused primarily on end point detection and have not used other inferable on-line information. This paper examines the use of mathematical models in conjunction with on-line development penetration data to determine process changes. An on-line sequential parameter identification scheme is used to calculate a current rate parameter value for the development model, and a Kalman filter is used to reduce erroneous observations caused by measurement noise. A powerful development monitor system results from the combination of real-time data, and on-line parameter and state estimation theory.
Additional Material:
14 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/aic.690360711
