Electronic Resource
New York, NY [u.a.]
:
Wiley-Blackwell
Advanced Materials for Optics and Electronics
4 (1994), S. 165-175
ISSN:
1057-9257
Keywords:
Simulation
;
Modelling
;
Resists
;
Chemical mechanisms
;
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Electrical Engineering, Measurement and Control Technology
,
Physics
Notes:
Simulation of lithographic processes uksing novolac/diazonaphthoquinone resists has become widespread over the past 15 years. Several refinements to the original Dill model have been made to account for experimentally observed behavior. Models have also bee extended to cover other resist chemistry, including electron beam resists, chemically amplified resists and surface-imaging approaches. While these models are not yet mature, useful insight to the chemical mechanisms and processing can be gained through their use.
Additional Material:
4 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/amo.860040210
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