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  • 1
    Electronic Resource
    Electronic Resource
    Hoboken, NJ : Wiley-Blackwell
    Journal of Biomedical Materials Research 38 (1997), S. 342-347 
    ISSN: 0021-9304
    Keywords: phosphorus ; ion implantation ; silica glass ; radiotherapy ; chemical durability ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Medicine , Technology
    Notes: A chemically durable glass containing a large amount of phosphorus is useful for in situ irradiation of cancers. It can be activated to be a β emitter (half-life of 14.3 days) by neutron bombardment. Microspheres of the activated glass injected into the tumors can irradiate the tumors directly with β rays without irradiating neighboring normal tissues. In the present study a P+ ion was implanted into a pure silica glass in a plate form at 100 keV in order to find the fundamental conditions for obtaining such a glass. Little phosphorus was present in the surface region, at least to a depth of 2.4 nm for doses of 5 × 1016 and 1 × 1017 cm-2, whereas an appreciable amount of it was distributed on the glass surface and a part of it was oxidized for doses above 5 × 1017 cm-2. The glasses implanted with doses of 5 × 1016 and 1 × 1017 cm-2 hardly released the P and Si into water at 95 °C, even after 7 days, whereas the glasses implanted with doses above 5 × 1017 cm-2 released appreciable amounts of these elements. Implantation energies of 20 and 50 keV (even at doses of 5 × 1016 and 1 × 1017 cm-2, respectively), formed oxidized phosphorus on the glass surfaces and gave appreciable releases of the P and Si into the hot water. This indicates that a chemically durable glass containing a larger amount of phosphorus could be obtained if a P+ ion is implanted at higher energies to localize in a deeper region of the glass surface. © 1997 John Wiley & Sons, Inc. J Biomed Mater Res (Appl Biomater) 38: 342-347, 1997
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
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