ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
The application of X-Ray lithography in mass production of devices is only economically viable if resist materials of highest sensitivity can be provided. Chemical amplification is the key concept to achieve such performance. It is outlined for a highly sensitive three component positive tone X-Ray resist, consisting of a Novolak binder matrix, a starter compound, which - on X-Ray exposure - yields an acid, which catalytically decomposes a dissolution inhibitor. Resist performance is discussed in terms of reaction kinetics and their implications on resist response, simulation, and handling procedures.
Additional Material:
4 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760291309
