ISSN:
1432-1858
Source:
Springer Online Journal Archives 1860-2000
Topics:
Electrical Engineering, Measurement and Control Technology
,
Technology
Notes:
Abstract The copolymer of methyl methacrylate and methacrylic acid was developed as a new sensitive resist for the LIGA (Lithographie, Galvanoformung, Abformtechnik) process. The resist exposures were carried out at the LIGA beamline of a superconducting compact light source NIJI-III. The absorbed energy density required to remove the entire exposed resist and produce a defect-free microstructure was between 0.4 and 7 kJ/cm3 (4 and 20 kJ/cm3 for PMMA). The sensitivity and patterning depth of the copolymer were 10 times and 3.5 times, respectively, those of poly methyl methacrylate (PMMA) assuming that both resists were exposed to synchrotron radiation (SR) of the same wavelength. Moreover, the copolymer showed high contrast and process stability.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF02447749
