Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
78 (2001), S. 2012-2014
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We propose a low-resistivity metal/Si/DySi2/Si multilayer Ohmic contact to n-type Si. For a DySi2 monolayer on n-type Si(111), the Fermi level has been found to be located only 0.08 eV below the conduction-band minimum of Si, corresponding to flatband conditions. Here, we demonstrate that this Fermi-level position is conserved to a large extent upon Si overgrowth of the monolayer, allowing us to exploit the flatband conditions for device applications under ambient conditions. © 2001 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1360782
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