Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
78 (2001), S. 1706-1708
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Ta/NiO/NiFe/Ta multilayers were prepared by rf reactive and dc magnetron sputtering. The exchange coupling field between NiO and NiFe reached 120 Oe. The composition and chemical states at the interface region of NiO/NiFe were studied using the x-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe=Ni+FeO and 3NiO+2Fe=3Ni+Fe2O3. The thickness of the chemical reaction as estimated by angle-resolved XPS was about 1–1.5 nm. These interface reaction products are magnetic defects, and we believe that the exchange coupling field Hex and the coercivity Hc of NiO/NiFe are affected by these defects. © 2001 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1343474
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