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Intrinsic resputtering in pulsed-laser deposition of lead-zirconate-titanate thin films (1995)

Hau, S. K. ; Wong, K. H. ; Chan, P. W. ; [et al.]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 66 (1995), S. 245-247

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: Pulsed-laser deposition (PLD) of lead-zirconate-titanate [Pb(Zrx,Ti1−x)O3] (PZT) thin films under low ambient pressure has been investigated by studying the angular deposition distributions of the constituent elements of the films. Nonstoichiometric profiles are observed and a dip occurs near the target surface normal of the deposition profile of lead. Experimental results show that intrinsic resputtering of the film is important in the PLD process and is responsible for the anomalous distribution of lead. © 1995 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.113560

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