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Epitaxial YBa2Cu3O7−y bolometers on micromachined windows in silicon wafers (1993)

Li, Q. ; Fenner, D. B. ; Hamblen, W. D. ; [et al.]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 62 (1993), S. 2428-2430

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: Epitaxial YBCO thin-film bolometers have been successfully fabricated on thin Si(100) substrates. Substrates included prethinned wafers ranging from 400 μm down to 4 μm thick, and a window, 0.75 μm thick, micromachined into a 400-μm wafer. As the Si is made thinner, the speed and responsivity both improve considerably. A 500-μs rise time was achieved on the micromachined window bolometer (0.75-μm-thick Si) under chopped infrared illumination. Calculations of heat flow in Si windows are in excellent agreement with the observed window-bolometer response waveform.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.109386

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