Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
60 (1992), S. 1301-1303
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We describe a new technique for measuring the thickness and optical constants of dielectric, semiconducting, and thin metal films. Beam profile reflectometry provides excellent precision for films as thin as 30 A(ring) and as thick as 20 000 A(ring). The technique is also capable of simultaneous 2 and 3 parameter measurements and it performs all measurements with a submicron spot size.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.107323
Library |
Location |
Call Number |
Volume/Issue/Year |
Availability |