ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We present an in situ study of the formation of the interfaces between TiO2 and SiO2 evaporated thin films using spectroscopic ellipsometry and x-ray photoemission spectroscopy (XPS). The growth of TiO2 on SiO2 was studied previously, but the reverse case has not received much attention up to now. In this article, we show that a common description is valid for both interfaces, which are formed by crosslinking Ti–O–Si bonds. We show also that the growth of TiO2 on SiO2 begins with an amorphous interface layer even when growth occurs at 400 °C. The interface is sharp, a few angstroms, as determined by angular XPS; when SiO2 grows on TiO2, the interface is thicker, about 10 Å. Roughness and interdiffusion play roles in interface formation and their role will be discussed. © 2002 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1494843
