Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
76 (1994), S. 5380-5382
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The influence of internal stress on the magnetic anisotropy and the magnetostriction was investigated in sputter-deposited amorphous (Tb0.27Dy0.73)0.42Fe0.58 films. Films with tensile stress show in-plane anisotropy and giant magnetostriction of λ(parallel)=400×10−6 at 1 T measured in a field parallel to the film plane at room temperature. The magnetostriction rises rapidly to λ(parallel)=200×10−6 at 0.05 T and the coercivity is less than 0.01 T. On the other hand films with compressive stress show perpendicular anisotropy and still higher magnetostriction of λ(parallel)=540×10−6 at 1 T; however, this is by far a slower increase of magnetostriction at small fields. This different behavior is explained by considering the nature of magnetization processes, i.e., domain-wall motion and spin rotation.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.357192
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