ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Boron carbide thin films of several B/C ratios have been deposited on Si(111) using plasma-enhanced chemical vapor deposition from nido-pentaborane(9) (B5H9) and methane (CH4). X-ray diffraction studies of boron carbide thin films on Si(111) exhibited characteristic microcrystalline diffraction lines. Soft x-ray emission spectroscopy was used to verify that the local electronic structure and composition of each sample corresponded to a homogeneous solid solution boron carbide phase.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.355066