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Fabrication of sol-gel derived ferroelectric Pb0.865La0.09Zr0.65Ti0.35O3 optical waveguides (1993)

Baude, P. F. ; Ye, C. ; Tamagawa, T. ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 73 (1993), S. 7960-7962

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: Crack-free transparent ferroelectric Pb0.865La0.09Zr0.65Ti0.35O3 [PLZT (9/65/35)] thin films have been deposited on silicon substrates using the sol-gel deposition technique. An intermediate layer of Pb0.90La0.10Ti0.975O3 (PLT) was used to improve the PLZT's optical quality and to reduce the amount of film cracking. Wet chemical etching, plasma etching, and reactive ion etching were investigated as means of realizing the necessary waveguide structures. Waveguiding was observed in 2–4 mm long by 20 μm wide PLZT (9/65/35) ridge waveguides fabricated by reactive ion beam etching.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.353928

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