Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
63 (1988), S. 4444-4450
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The defects leading to haze formation after diffusion of the transition metals cobalt, nickel, copper, and palladium have been studied by means of transmission electron microscopy and preferential etching. In all cases crystalline metal silicide particles have been observed. Both cobalt and nickel form disilicide particles of different morphologies in the surface regions of silicon wafers, whereas copper and palladium form metal-rich silicide particles causing a supersaturation of Si self-interstitials or undersaturation of vacancies and leading to the formation of extrinsic dislocation loops.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.340164
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