ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
GaAs/AlGaAs heterostructure selectively doped with Si was grown in a conventional normal pressure metalorganic chemical vapor deposition using trimethyl metals and arsine. Mobility of the two-dimensional electron gas as high as 8100, 148 000, and 401 000 cm2/V s was obtained at 300, 77, and 5 K, respectively, for a sample with an undoped Al0.3Ga0.7As spacer layer of 100 A(ring) and with a sheet electron density of about 5×1011 cm−2. The heterostructure with the spacer layer thinner than 100 A(ring) shows high mobility comparable to the best values obtained by molecular-beam epitaxy. The influence of growth parameters on the electron mobility in the heterostructure is described in detail.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.337648
