Electronic Resource
College Park, Md.
:
American Institute of Physics (AIP)
The Journal of Chemical Physics
110 (1999), S. 4647-4650
ISSN:
1089-7690
Source:
AIP Digital Archive
Topics:
Physics
,
Chemistry and Pharmacology
Notes:
We report the absolute column densities of gas phase C6H6 and upper limits on absolute C4H2 and C2H3 concentrations in a hot filament diamond chemical vapor deposition (CVD) reactor. The steady state density of C6H6 is monitored as a function of C2H2 and H2 input fractions. The C6H6 column density is a quadratic function of input C2H2 fraction at low C2H2 fractions. Above a critical C2H2 input fraction, the C6H6 column density becomes independent of C2H2 input fraction. The column density of gas phase C6H6 is relatively insensitive to the input H2 fraction. The weak relationship between C6H6 and H2 input fraction is in contradiction to the conclusion drawn from chemical kinetics modeling of diamond CVD that H2 strongly suppresses the formation of aromatic species under diamond CVD conditions. Moreover, comparison of C6H6 column densities with previously measured CH3 column densities under similar conditions indicate that a comparable fraction of gas phase carbon atoms in the steady state are incorporated in C6H6 as are incorporated in the growth species CH3. © 1999 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.478347
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