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Electrodeposition of rhenium on tungsten hot plate used in Q plasma source (1989)

Paris, P. J.

[S.l.] : American Institute of Physics (AIP)

Review of Scientific Instruments 60 (1989), S. 2802-2804

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ISSN: 1089-7623

Source: AIP Digital Archive

Topics: Physics , Electrical Engineering, Measurement and Control Technology

Notes: The brief note describes diverse aspects of the technique used for rhenium plating the hot plate used for contact ionization of barium in a Q plasma source. The rhenium plating optimizes the probability of barium ionization. Special care has to be taken in order to deposit a uniform layer of rhenium, for this purpose a slow rotation is given to the plate during deposition.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.1140664

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