ISSN:
1551-2916
Source:
Blackwell Publishing Journal Backfiles 1879-2005
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
Fabrication of mullite (3Al2O3·2SiO2) coatings by chemical vapor deposition (CVD) using AlCl3–SiCl4–H2–CO2 gas mixtures was studied. The resultant CVD mullite coating microstructures were sensitive to gas-phase composition and deposition temperature. Chemical thermodynamic calculations performed on the AlCl3–SiCl4–H2–CO2 system were used to predict an equilibrium CVD phase diagram. Results from the thermodynamic analysis, process optimization, and effects of various process parameters on coating morphology are discussed. Dense, adherent crystalline CVD mullite coatings ∼2 μm thick were successfully grown on Si3N4 substrates at 1000°C and 10.7 kPa total pressure. The resultant coatings were 001 textured and contained well-faceted grains ∼0.3–0.5 μm in size.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1111/j.1151-2916.2004.tb07491.x