Electronic Resource
s.l. ; Stafa-Zurich, Switzerland
Solid state phenomena
Vol. 99-100 (July 2004), p. 175-180
ISSN:
1662-9779
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Physics
Notes:
The influence of plasma processing of silica and crystalline silicon substrates on theformation of polymeric layers of PS/PMMA blends by sorption from 50 vol. % concentration toluene solutions was analyzed. The morphology dependence of PS/ PMMA blend films on the type and condition of substrate processing was studied by X-ray photoelectron spectroscopy (XPS), ellipsometry and atomic force microscopy (AFM). It was shown that reduction of carbon and oxygencomponents from the surface contaminants as well as the existence of a nonstoichiometric SiOx layer on the Si surface contributed to the hydrophilicity of the substrate. These processes can be used to produce thin nanostructured polymer blend films
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/26/transtech_doi~10.4028%252Fwww.scientific.net%252FSSP.99-100.175.pdf
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