ISSN:
0142-2421
Keywords:
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Physics
Notes:
Ion implantation and Rutherford backscattering are combined to study: (1)the effects of caesium doping and caesium bombardment on SIMS emission yields,(2)the carbon emission yield as a function of its concentration in Ti1-xCx films. Quantitative analysis by SIMS of such films can be performed with an accuracy of 5%.
Additional Material:
5 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/sia.740140908
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