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The properties of a-C:H films deposited by bias sputtering of carbon (1990)

Zou, J. W. ; Schmidt, K. ; Reichelt, K. ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 68 (1990), S. 1558-1562

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: Carbon films were deposited by rf bias sputtering of a carbon target in argon. Bias voltage and argon pressure were varied systematically. Hardness, internal stress, density, hydrogen content, and infrared absorption were measured as functions of the preparation parameters. From the IR measurements the bond ratio of sp3 to sp2 was calculated and the total amount of hydrogen in the films was determined by elastic recoil detection. The hydrogen content was found to be much lower than for films prepared by plasma decomposition of hydrocarbons. Because the film thickness was in the range of 500 nm, the hardness was measured with an ultralow-load diamond indenter. For these measurements the indentation depth was about 60 nm. The internal stress was determined by the bending beam method. The coordination number, number density, and the filling factor were calculated from the measured values. The results have been compared to those for films deposited by plasma decomposition of hydrocarbons.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.346634

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Schmidt, K. E. ; Moskowitz, J. W.

College Park, Md. : American Institute of Physics (AIP)

The Journal of Chemical Physics 93 (1990), S. 4172-4178

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ISSN: 1089-7690

Source: AIP Digital Archive

Topics: Physics , Chemistry and Pharmacology

Notes: We apply the variational Monte Carlo method to the atoms He through Ne. Our trial wave function is of the form introduced by Boys and Handy. We use the Monte Carlo method to calculate the first and second derivatives of an unreweighted variance and apply Newton's method to minimize this variance. We motivate the form of the correlation function using the local current conservation arguments of Feynman and Cohen. Using a self-consistent field wave function multiplied by a Boys and Handy correlation function, we recover a large fraction of the correlation energy of these atoms. We give the value of all variational parameters necessary to reproduce our wave functions. The method can be extended easily to other atoms and to molecules.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.458750

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Mechanical properties of a-Si:H films studied by Brillouin scattering and nanoindenter (1990)

Jiang, X. ; Goranchev, B. ; Schmidt, K. ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 67 (1990), S. 6772-6778

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: A series of a-Si:H films has been prepared by rf sputtering in a H2-Ar gas mixture. To obtain films with different hydrogen content the hydrogen portion of the gas mixture was changed from 0% to 20%. The shear modulus μ was then measured by the frequency of the surface phonon (Rayleigh wave). The stiffness S and the ultramicrohardness H were measured by using a nanoindenter. From the shear modulus μ and the stiffness S, the Young's modulus E and Poisson's ratio ν were calculated. The intrinsic mechanical stress was measured by the bending-beam method. With increasing hydrogen content of the films, the decrease of Young's modulus, microhardness, and internal stress are observed.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.345064

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The properties of a-C:H films deposited by plasma decomposition of C2H2 (1990)

Zou, J. W. ; Schmidt, K. ; Reichelt, K. ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 67 (1990), S. 487-494

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: Diamondlike a-C:H films have been deposited by plasma decomposition of C2 H2. 50 samples were prepared with a systematic variation of the deposition parameters: the substrate bias voltage was between −100 and −1400 V and the C2 H2 gas pressure was between 4×10−4 and 2.6×10−1 mbar. The following properties of the films were measured: the density by Rutherford backscattering, the total concentration of hydrogen by elastic recoil detection, the bonding ratio sp3 /sp2 by infrared spectroscopy, the internal stress by the bending beam method, and the hardness with a Knoop microhardness tester. It has been shown that the hardness and other mechanical properties cannot be correlated to the average carbon coordination number mc. This is because mc is calculated under the assumption of a homogenous single-phase model, which does not seem to be justified. It is demonstrated that the mechanical properties can be explained by the application of a void model.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.345230

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