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LIF diagnostics of C2 radical behaviour in a laser CVD environment (1987)

Okada, T. ; Nishigoori, T. ; Kajiyama, Y. ; [et al.]

Springer

Applied physics 44 (1987), S. 175-179

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ISSN: 1432-0649

Keywords: 32.50.+d ; 82.30.Cf ; 82.50.-m

Source: Springer Online Journal Archives 1860-2000

Topics: Physics

Notes: Abstract A laser-induced fluorescence (LIF) system was developed to diagnose the reaction and transport of radicals in the ArF-laser-assisted CVD environment. The C2(a 3 II u) radicals were produced by the multi-photon dissociation of C2H2. The transport of the radical was directly measured by LIF. The disappearance rate of the radical in C2H2 was also determined. By using the values determined, the in-flux of the C2 radicals onto a substrate was investigated, based on a diffusion model.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1007/BF00692320

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