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  • 1990-1994  (3)
  • 1990  (3)
Material
Years
  • 1990-1994  (3)
Year
  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 61 (1990), S. 1256-1258 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A new rf source producing a large and uniform plasma with magnetic field-free geometry for neutral beam has been developed. The source consists of a small-diameter multiple-rf plasma generator and a bucket chamber as a plasma expansion section. The plasma density scaling, the spatial profile, and the ion beam extraction have been studied by using the single rf plasma generator. It was found that under the optimized conditions the plasma density and the profile in the expanded plasma were essentially ruled by qualities of the bucket chamber itself. The present rf source is promising for the application of large-volume positive-ion source or plasma processing.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 61 (1990), S. 398-400 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A new rf source producing a large and uniform plasma with magnetic field-free geometry for neutral beam has been developed. The source consists of a small-diameter multiple-rf plasma generator and a bucket chamber as a plasma expansion section. The plasma density scaling, the spatial profile, and the ion beam extraction have been studied by using the single rf plasma generator. It was found that under the optimized conditions the plasma density and the profile in the expanded plasma were essentially ruled by qualities of the bucket chamber itself. The present rf source is promising for the application of large-volume positive-ion source or plasma processing.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Journal of applied electrochemistry 20 (1990), S. 1021-1024 
    ISSN: 1572-8838
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Electrical Engineering, Measurement and Control Technology
    Notes: Abstract The Zn|3m AlCl3 (aq)|MnO2 galvanic cell gives an open circuit voltage (OCV) of 2.0V. When the cell is discharged at constant current (1.5 mA cm−2 or 50 mAg−1), its discharge curve shows a relatively flat portion in the region 2.0–1.6 V and the cell has an energy density of 550 Wh (kg of MnO2)−1 with a discharge capacity of 330 mA (kg of MnO2)−1, these values being about 2 times and 1.5 times, respectively, larger than those of the Zn|5m ZnCl2|MnO2 cell. The cell also shows good discharge behaviour at higher electric currents (for example 9.5 mAcm−2 or 240 mAg−1), and the advantages of the Zn|AlCl3|MnO2 cell over the Zn|ZnCl2|MnO2 are clear at the higher discharge currents. The high discharge voltage, energy density, and discharge capacity of the Zn|AlCl3|MnO2 cell are attributed to the strong buffering effect of AlCl3 at pH∼3. Due to this buffering effect, the electrolytic solution causes gradual corrosion of the zinc and, consequently, the cell is suited to water-activation.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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