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Ion-induced densification of pvd films–a choice of the optimum density of ion bombardment (1996)

Grigorov, G. I. ; Grigorov, K. G. ; Sporken, R. ; [et al.]

Springer

Applied physics 63 (1996), S. 399-401

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ISSN: 1432-0630

Keywords: PACS: 81.15; 81.40

Source: Springer Online Journal Archives 1860-2000

Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics

Notes: Abstract. The densification process by ion-assisted physical vapour deposition of films is considered as a consequence of rearrangement of atoms in the near-surface film layer. A model is proposed allowing the quantitative estimate of the optimum ion current density required to produce a film with maximum density.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1007/s003390050406

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