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An optical differential reflectance study of adsorption and desorption of xenon and deuterium on Ni(111) (1996)

Wong, A. ; Zhu, X. D.

Springer

Applied physics 63 (1996), S. 1-8

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Details

ISSN: 1432-0630

Schlagwort(e): 78.66 ; 82.65

Quelle: Springer Online Journal Archives 1860-2000

Thema: Maschinenbau , Physik

Notizen: Abstract We studied adsorption and desorption of Xe and deuterium on Ni(111) using an optical differential reflectance technique. The main findings are: (i) the differential reflectance varies almost linearly with the surface densities of deuterium and Xe adatoms, and the signals can be described well with a three-layer model and the known dielectric responses of the surface layers: (ii) the adsorption of deuterium atT = 120 K follows the Langmuir kinetics, while the adsorption of Xe atT = 38 K follows the zeroth-order kinetics; (iii) nearT = 70 K, the rate of Xe desorption is almost coverage-independent with an activation energy ofE des = 4.4 ± 0.2 kcal/mol. Our analysis suggests that the Xe desorption is likely to be dominated by the escape rate from the corners of two-dimensional Xe islands.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1007/BF01579739

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