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  • 1995-1999  (5)
  • Hydrous zirconium oxide  (3)
  • Chemistry  (2)
  • Polymer and Materials Science  (2)
  • 1
    ISSN: 1612-1112
    Keywords: Ion chromatography ; Hydrous zirconium oxide ; Porous polymer resin ; α-Hydroxyl carboxylic acids
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Summary A porous polymer resin loaded with hydrous zirconium oxide (Zr-gel) was evaluated as a selective stationary phase for the ion chromatographic separation of carboxylic acids. We have found that Zr-gel has a specificity to the α-hydroxyl groups on carboxylic acids. Using 3×10−3 mol l−1 of sodium carbonate as a mobile phase, monocarboxylic acids such as formate, acetate, propionate and butyrate, were immediately eluted at the void volume of the Zr-gel column, whereas α-hydroxy-monocarboxylic acids such as glycolate and lactate were clearly retained. Dicarboxylic acids with an α-hydroxyl group, viz., malate and tartarate, were also strongly retained and not eluted from the Zr-gel column.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1612-1112
    Keywords: Column liquid chromatography ; Hydrous zirconium oxide ; Porous polymer resin ; Disubstituted phenols ; ortho-Benzoic acid derivatives
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Summary A porous polymer resin loaded with hydrous zirconium oxide (Zr-gel) was evaluated as a stationary phase for the liquid chromatographic separation of disubstituted aromatic compounds. The prepared Zr-gel was used to separate disubstituted phenols andortho-substituted benzoic acid derivatives in reversed-phase mode. The retention time of catechol was greater than those of other disubstituted phenols; this implies that the Zr-gel has specificity for the phenolic hydroxyl group. The retention behavior ofortho-substituted benzoic acid derivatives on the Zr-gel was also evaluated in reversedphase mode using buffer. Phthalic acid was specifically retained in the vicinity of pH 6.0, which has been regarded as the equal adsorbic point. Similar behavior was also observed for salicylic acid, although the retention time of salicylic acid was less than that of phthalic acid. It seems that the specific retention behavior of hydrous zirconium oxide is a result of complexation with ligands such as hydroxyl and carboxyl groups. The results of this study have revealed that the retention mechanism of hydrous zirconium oxide is a combination of ion exchange and interaction based on complexation with ligands.
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 1612-1112
    Keywords: Column liquid chromatography ; Hydrous zirconium oxide ; Porous polymer resin ; Silica gel ; ortho-Benzoic acid derivatives
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Summary Silica gel loaded with hydrous zirconium oxide (Zr-gel-S) has been prepared and the influence of the base material on the retention behavior ofo-phthalic acid on the hydrous zirconium oxide was evaluated. The retention behavior of the acid on the Zr-gel-S was compared with that on Zr-gel-5, the polymer-based Zr-gel. Comparable retention behavior,i.e. maximum retention in the vicinity of pH 6, which has been regarded as the equal adsorbic point, was observed for both types of Zr-gel, although there was a large difference in the retention times. The difference in retention on the two types of Zr-gel could be ascribed to nature of the base material. The results in this experiments showed, however, that the specific behavior at pH 6 was an essential characteristic of hydrous zirconium oxide and was not related to the influence of the base materials.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 24 (1996), S. 252-256 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: X-ray photoelectron spectroscopy (XPS) of Ne ion-bombarded polymer has been carried out in order to examine the cause of HeLa cell adhesion control on polymers. Substrates used were polystyrene (PS) and oxygen plasma-treated polystyrene (PS-O). Neon bombardments into the patterned region of PS and PS-O were performed at an energy of 150 keV with fluences of 1×1014 and 1×1015 ions cm-2. The surface chemical bonding states were investigated by XPS. In HeLa cell adhesion measurements, the Ne-bombarded region of PS with a fluence of 1×1015 ions cm-2 exhibits higher adhesion and spreading of HeLa cells than the unbombarded region. On the contrary, it is found that the Ne-bombarded region of PS-O inhibits HeLa cell adhesion. The XPS results show that Ne bombardment to PS or PS-O destroys the original chemical bonds and consequently produces new functional groups. It is considered that the drastic change of surface chemical bonding states from the pristine states induced by Ne bombardment leads to a clear distinction between increasing and inhibiting HeLa cell adhesion.
    Additional Material: 7 Ill.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 24 (1996), S. 578-582 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Angle-dependent high-resolution XPS spectra of S 2p, In 3d5/2 and P 2p have been measured on the InP(001) sample etched chemically, treated with (NH4)2Sx at room temperature (RT), exposed to air at RT and annealed at 400°C in a vacuum. Three kinds (S-I, S-II and S-III) of chemical states of sulphur on the (NH4)2Sx-treated InP(001) surface at RT are found. It is suggested that S-I, S-II and S-III correspond to sulphur in the bulk, sulphur bridge-bonded to indium on the surface and elemental sulphur, respectively. Chemical state of S-III is decreased for the treated sample exposed to air at RT for 1 month. It is removed upon annealing the sample at 400°C in a vacuum, while S-I and S-II remain on the surface. The thickness of the sulphide layer on the annealed surface is estimated to be about one monolayer. Angle-dependent XPS spectra of S 2p and In 3d5/2 are discussed.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
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