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  • 1995-1999  (2)
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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 3348-3350 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A fabrication method using a metal-covered scanning tunneling microscope tip has been developed to provide a nanoscale deposition method with various metal species. Nanoscale deposition has been carried out on highly oriented pyrolytic graphite with a core tungsten tip, a gold-covered tungsten tip, and an aluminum-covered tungsten tip, by applying tip positive voltage pulses. The threshold voltage, above which deposition occurred, showed a linear dependence on the tip-sample separation and differed for tip material. This suggests that the fabrication mechanism is field-induced and the deposition takes place by the transfer of tip material to the sample. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 69 (1996), S. 2605-2607 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A novel class of low molecular-weight organic resist materials for nanometer lithography, 1,3,5-tris[4-(4-toluenesulfonyloxy)phenyl]benzene (TsOTPB) and 4,4′,4″-tris(allylsuccinimido) triphenylamine (ASITPA), was designed and synthesized. TsOTPB with a glass-transition temperature (Tg) of 64 °C and ASITPA with a Tg of 80 °C were found to function as positive and negative resists, respectively, enabling the fabrication of 150 and 70 nm line patterns on exposure to an electron beam at 50 keV. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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