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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 2644-2649 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Solid-phase epitaxial growth was studied in germanium-implanted 〈100〉 silicon wafers as a function of germanium fluence, annealing temperature, and time. MeV He Rutherford backscattering in channeling conditions, cross-sectional transmission electron microscopy, double-crystal x-ray diffraction, and secondary-ion mass spectroscopy techniques were used to characterize the samples. At low fluences, up to 1×1015 cm−2 at 130 keV, the crystallization kinetics is similar to that measured on self-amorphized silicon. In the high-dose samples, prepared by multiple implants with a total dose of 3.12×1016 cm−2, the growth rate at fixed temperatures decreases. A comparison with literature data, obtained by similar experiments performed on amorphized uniform GexSi100−x films prepared by molecular-beam epitaxy or chemical-vapor deposition, reveals that the concentration gradient, unavoidable in implanted samples mainly at the end of the ion range region, is strictly connected with the observed decrease.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 2359-2369 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: B-Si and Ge-Si thin-film solid solutions on silicon at different compositions are analyzed by multiple-crystal x-ray diffraction. Computer simulations of the rocking curves are made with a diffraction model which, for dilute alloys, does not differ from that commonly reported in the literature. For sufficiently high solute atomic fractions, modifications are introduced to the Fourier coefficients of the crystal polarizability and to the parameters depending on the lattice strain. In the B-Si case, the comparison between strain and carrier profiles resulting from the simulations and electrical measurements, respectively, gives information on the fraction of substitutional B, the presence of precipitates, and their coherent or incoherent nature. In the Ge-Si case, the solute fraction, its depth gradient, and the static atomic disorder in the alloy are determined by means of the modified diffraction model. In particular, the determination of the atomic displacements around the lattice points in fully strained thin-film Ge-Si alloys give results larger than those evaluated by Monte Carlo calculations for relaxed solid solutions.
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Laser-annealed and further thermally annealed arsenic implanted silicon specimens have been investigated in a range of doses from 1×1016 to 5×1016 As/cm2, with different experimental techniques: electrical measurements, transmission electron microscopy (TEM), double-crystal x-ray diffractometry (DCD), and extended x-ray absorption fine structure analysis (EXAFS). On the as laser-annealed samples, in the whole range of doses examined, a lattice contraction of the doped layer has been evidenced by DCD, whereas, on the same specimens, EXAFS measurements have shown the presence of a local expansion around substitutional As atoms. The relationship between strain and carrier concentration has been found to be approximately linear and can be described by the presence of a size and an electronic effect, as recently proposed in the literature. The former effect represents the atomic size contribution, while the latter is the strain induced by the variation of the conduction-band minima due to the doping. After a subsequent thermal annealing in a low-temperature range (350–550 °C), a strong deactivation of the dopant has been evidenced by electrical measurements. From the experimental results, a new model of the first step of the As deactivation phenomenon at low temperature is proposed. It is described by the capture of two electrons from a pair of As atoms in the second neighbor position in the Si lattice, leading to the formation of a positively charged arsenic-vacancy cluster (As2V)+, and to the emission of a negatively charged Si self-interstitial I−. This model takes into account the main phenomena that are experimentally observed simultaneously to the As deactivation, i.e., the transition from a contraction to a dilatation of the strain observed by DCD and the formation of interstitial loops. At relatively high temperatures (650–900 °C), the hypothesis of the coexistence of the clusters and of the observed precipitates has to be taken into account in order to explain the nature of the inactive As. However, whether clustering or precipitation is the dominant phenomenon still remains an open question.
    Type of Medium: Electronic Resource
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  • 4
    ISSN: 1600-5767
    Source: Crystallography Journals Online : IUCR Backfile Archive 1948-2001
    Topics: Geosciences , Physics
    Notes: A feasibility study of an X-ray experiment is presented by which the lattice parameter of a silicon wafer relative to that of a perfect reference silicon crystal can be measured with a precision of 10−7. A multicrystal geometry in the symmetric Bragg case is proposed, using a monolithic monochromator as a beam splitter. Sample and analyser crystals are aligned with respect to the monochromator and the rotation of the analyser around its Bragg position produces two diffraction peaks. Their separation is related to the difference between the lattice parameters of monochromator and sample. The sample can be a piece of any commercial slice, generally cut from the ingot with an angle between the surface normal and the nominal crystallographic orientation and bent due to the mirror finishing on only one side. Moreover, the bending can be induced by layers grown on the surface by the processes of planar technology. Miscutting angle and curvature influence the diffraction peak position. The X-ray tracing and the procedure chosen for measurement eliminate these effects.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Copenhagen : International Union of Crystallography (IUCr)
    Applied crystallography online 25 (1992), S. 439-439 
    ISSN: 1600-5767
    Source: Crystallography Journals Online : IUCR Backfile Archive 1948-2001
    Topics: Geosciences , Physics
    Notes: Corrected Figs. 4 and 5 for the paper by Servidori, Cembali, Fabbri & Zani [J. Appl. Cryst. (1992). 25, 46–51] are given.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    Copenhagen : International Union of Crystallography (IUCr)
    Applied crystallography online 25 (1992), S. 46-51 
    ISSN: 1600-5767
    Source: Crystallography Journals Online : IUCR Backfile Archive 1948-2001
    Topics: Geosciences , Physics
    Notes: The simulation of the experimental symmetric X-ray rocking curve of a coherent heteroepitactic structure, using first-order expressions in the incidence parameter, is shown to give a strain-depth profile not consistent with asymmetric rocking curves taken on the same sample. Two different expressions are suggested for the incidence parameter to attain internal consistency among all the rocking curves. The former involves second-order approximations and considers both normal and parallel lattice mismatches. The latter is the result of an exact derivation and takes into account only the normal mismatch. These models make the data from rocking-curve simulation reliable, provided that the angle between the surface and the planes corresponding to the nominal crystallographic orientation is not ignored.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 38-41 (Jan. 1991), p. 243-248 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 38-41 (Jan. 1991), p. 213-218 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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  • 9
    ISSN: 1432-0630
    Keywords: 61.80 ; 68.55
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract 30 keV boron ions are implanted at doses of 2×1014 and 2×1015 cm−2 in 〈100〉 silicon wafers kept at room or liquid-nitrogen temperatures. The samples are analyzed by double-crystal X-ray diffraction, transmission electron microscopy and secondary ion-mass spectrometry before and after furnace annealing at 800°C. The low-dose implant does not amorphize the substrate at any of the temperatures, and residual defects together with a remarkably enhanced boron diffusion are observed after annealing. The high-dose implant amorphizes the substrate only at low temperature. In this case, unlike the room-temperature implant, the absence of any residual defect, the incorporation of the dopant in substitutional position and a negligible profile braodening of boron are obtained after annealing. In principle, this process proves itself a promising step for the fabrication of p +/n shallow junctions with good electrical characteristics.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Springer
    Archives of gynecology and obstetrics 255 (1994), S. 43-46 
    ISSN: 1432-0711
    Keywords: Bone maturation ; Adolescence ; Growth ; Pubertal height
    Source: Springer Online Journal Archives 1860-2000
    Topics: Medicine
    Notes: Abstract Skeletal maturity was studied in 82 healthy adolescent girls age between 12 and 19 who had reached the menarche from 0.5 to 5 years previously. 56 subjects (68,2%) had closed epiphyses while they were open in 26 (31.8%). The incidence of open epiphyses was 61% in the first year after the menarche and progressively decreased showing negative correlation with time elapsed since the menarche (r=0.98, P〈0.0001). The mean ± SE height increased from 158.7±1.3 cm in the first year after the menarche, to 162.7±1.3 cm in the fifth year after the menarche. No significant differences were seen in estradiol, estrone, testosterone, dihydrotestosterone and androstenedione levels between subjects with open or closed epiphyses while dehydroepiandrosterone and its sulfate levels were higher in the closed epiphyses group. Girls with open epiphyses at first evaluation grew about 3,5 cm in the next three years.
    Type of Medium: Electronic Resource
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