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  • 1985-1989  (2)
  • 1980-1984  (1)
  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 59 (1986), S. 2958-2967 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A comprehensive characterization of the damage and contamination produced in silicon by CC1F3/H2 reactive ion etching is presented. This highly selective SiO2-to-Si reactive ion etching process unfortunately produces all three of the deleterious damage-contamination layers that can result from dry etching exposure; viz., CC1F3/H2 reactive ion etching produces a residue layer on the Si surface, a permeated layer at the Si near-surface, and a layer of damaged Si. Various post-RIE-exposure, surface-recovery approaches are evaluated in this report. The results indicate that in order to restore the surface to a device-quality state, it is not sufficient to simply eliminate surface contamination. Damage incurred in the silicon bonding must be restored or removed. The latter can be accomplished by suitable treatments such as wet chemical silicon etch or silicide formation.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Polymer bulletin 10 (1983), S. 21-27 
    ISSN: 1436-2449
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Summary Methylmethacrylate has been successfully polymerized to high conversions and high molecular weight polymers with aqueous suspension of hydrogen-bentonite in the presence of aliphatic alcohols. Both extractable and non-extractable polymers were obtained. The overall initial rates of polymerization increased with increasing ethanol concentrations. The constancy in the viscosity average moles of polymer at higher ethanol concentrations indicates that transfer to alcohol was unimportant. E.s.r. and x-ray studies suggest a free radical mechanism for such polymerizations. It has been postulated that interlamellar silicate layers are responsible for generating the free radicals.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Bognor Regis [u.a.] : Wiley-Blackwell
    Journal of Polymer Science Part A: Polymer Chemistry 27 (1989), S. 3977-3983 
    ISSN: 0887-624X
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: Initiation of polymerization of methyl methacrylate with redox system montmorillonite (with lattice Fe3+)-thiourea has been achieved. The rates are dependent on both clay mineral and thiourea. Amidosulfenyl radicals are believed to initiate the polymerization on the clay surface. The polymerization produced nonextractable clay-polymer adduct up to an extent of 70 wt %. The pH of the medium (in the acidic range) did not affect the polymerization rate.
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
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